¡Ü ³ª³ë ÀÔÀÚÀÇ Å©±â¿Í Ç¥¸éÀÇ Á¦Å¸ ÀüÀ§, ´Ü¹éÁú À̵¿, ºÐÀÚ·®, ¹Ì¼¼ À¯º¯ÇÐÀ» ÃøÁ¤ÇÕ´Ï´Ù.
¡Ü Dynamic Light ScatteringÀ» ÀÌ¿ëÇÑ Nano particle size analyzer·Î¼ ÀÔÀÚÀÇ Å©±â ºÐÆ÷ ¹× Á¦ Ÿ ÀüÀ§¸¦ ÃøÁ¤ÇÏ´Â ±â±â ÀÔ´Ï´Ù.
¡Ü 15¡Æ, 90¡Æ & 173¡Æ 3Áß °¢µµ·Î ½Ã·á¿¡ ¸Â°Ô ÃøÁ¤ÇÏ¿© º¸´Ù Á¤È®ÇÑ µ¥ÀÌÅ͸¦ ¾òÀ» ¼ö ÀÖ½À´Ï´Ù.
¡Ü 552°³ÀÇ Çϵå¿þ¾î ä³Î¿¡¼ ´Ù·®ÀÇ µ¥ÀÌÅ͸¦ ¼öÁýÇÏ¿© ¹Ì¼¼½ÅÈ£¸¦ Á¤È®È÷ ÃøÁ¤ÇÕ´Ï´Ù. ÁøÁ¤ÇÑ PALS ½ÅÈ£·Î ºÐ¼®ÀÌ °¡´ÉÇÕ´Ï´Ù.
¡Ü °£ÆíÇÏ°Ô Excel µ¥ÀÌÅÍ·Î º¯È¯µË´Ï´Ù.
¡Ü Å©±â ¹× Á¦Å¸ÀüÀ§ ÃøÁ¤ ½Ã ÀÏ¹Ý Cell »ç¿ë
»ó°ü±â(Correlator)
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1010 µ¥ÀÌÅÍ Ã¤³Î, 522 Çϵå¿þ¾î µ¥ÀÌÅÍ Ã¤³Î (½Ç½Ã°£ µ¥ÀÌÅÍ ºÐ¼®)
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¿Âµµ Á¶Àý
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-5 ¡Æ
C to 110 ¡Æ C, ¡¾ 0.1 ¡Æ C
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ÀÀ°á Á¶Àý
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°ÇÁ¶ °ø±â (¿É¼Ç: Áú¼Ò °¡½º)
|
·¹ÀÌÀú
|
40 mW
640 nm temperature-controlled red semiconductor laser. (¿É¼Ç: 40 mW, 514 nm)
|
ÃøÁ¤ °¢µµ
|
90¡Æ, 173¡Æ
& 15¡Æ
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¼ÒÇÁÆ®¿þ¾î
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ÃøÁ¤ ¹× ºÐ¼®, ¹Ì¼¼À¯º¯ÇÐ, ´Ü¹éÁúºÐ¼®
o Average & width
o lognormal fit & multimodal
size distribution for sizing
o Doppler Frequency Shift
o Electrophoretic mobility
o Zeta potential using Smoluchowski,
Huckel, or Henry
|
Å©±â ÃøÁ¤
|
Å©±â ÃøÁ¤¹üÀ§
|
0.3nm
~ 10¥ìm (½Ã·á¿¡ µû¶ó º¯°æ)
|
³óµµ ¹üÀ§
|
0.1 ppm to 50
mg/mL
|
ÃÖ´ë½Ã·á Àüµµµµ
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¹«Á¦ÇÑ
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½Ã·á ¼¿
|
1 to 3 mL ÀÏȸ¿ë Æú¸®½ºÆ¿·», 50 ¥ìL ÀÏȸ¿ë Æú¸®½ºÆ¿·», 40 ¥ìL ¼®¿µ À¯µ¿¼¿, 10 ¥ìL ¼®¿µ ¼¿
|
½ÅÈ£ ó¸®
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Dynamic
Light Scattering, DLS
|
Á¤È®µµ
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¡¾ 1% typical
|
Á¦Å¸ ÀüÀ§ ÃøÁ¤
|
Á¦Å¸ÀüÀ§ ÃøÁ¤ ¹üÀ§
|
-500 mV to
500 mV, sample dependent
|
³óµµ ¹üÀ§
|
40%
v/v, sample dependent
|
À̵¿µµ ¹üÀ§
|
10-11 to 10-7
m2 /V*s
|
ÃÖ´ë½Ã·á Àüµµµµ
|
220
mS/cm
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½Ã·á ¼¿
|
175 ¥ìL, 450
¥ìL, 1250 ¥ìL
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½ÅÈ£ ó¸®
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Àü±â¿µµ¿±¤»ê¶õ(ELS), À§»óºÐ¼®±¤»ê¶õ(PALS)
|
Á¤È®µµ
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¡¾ 3% typical
|
Àü±Ø ¼ÒÀç
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Pd
|
Àü±Ø °£ °Å¸®
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3.6 mm
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ºÐÀÚ·® ÃøÁ¤
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ºÐÀÚ·® ÃøÁ¤¹üÀ§
|
~980 Da to 20
MDa, (½Ã·á¿¡ µû¶ó º¯°æ)
|
|
|
ÀϹݱ԰Ý
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ÄÄÇöóÀ̾ð½º
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ISO13321,
ISO22412
|
Àü·Â·®
|
100/115/220/240
VAC, 50/60 Hz, 150 Watts
|
Å©±â
|
23.3
x 42.7 x 48.1 cm (HWD)
|
¹«°Ô
|
15 kg
|
»ç¿ë ȯ°æ
|
Temperature
10 ¡Æ C to 75 ¡Æ C
Humidity
0% to 95%, non-condensing
|
CE ÀÎÁõ
|
Class
I laser product, EN 60825-1:2001, CDR
|
NanoBrook
|
90Plus
|
ZetaPlus
|
Zeta PALS
|
90Plus Zeta
|
90Plus PALS
|
173
|
173Plus
|
Omni
|
´Ü¹éÁú Å©±â
|
|
|
|
|
|
X
|
X
|
X
|
Backscatter
|
|
|
|
|
|
X
|
X
|
X
|
IgG/mAb
|
|
|
|
|
|
X
|
X
|
X
|
Á¦¾à ¹× ¿ø·áÀǾàÇ°
|
X
|
|
|
X
|
X
|
X
|
X
|
X
|
´Ü¹éÁú °áÁ¤È
|
|
|
|
|
|
X
|
X
|
X
|
´Ü¹éÁú ÀüÀ§
|
|
|
|
|
X
|
|
|
X
|
´Ü¹éÁú ¿ëÇØÁ¡t
|
|
|
|
|
|
X
|
X
|
X
|
¿ÂµµÁ¶Àý ±â´É
|
X
|
|
|
X
|
X
|
X
|
X
|
X
|
´Ü¹éÁú ¾ÈÁ¤µµ
|
|
|
X
|
|
|
X
|
X
|
X
|
ÀÔµµ Å©±â
|
X
|
|
|
X
|
X
|
X
|
X
|
X
|
ÀÔµµ ºÐ»ê
|
X
|
|
|
X
|
X
|
X
|
X
|
X
|
³ª³ë ÀÔÀÚ Å©±â
|
X
|
X
|
X
|
X
|
X
|
X
|
X
|
X
|
Micelles, Microemulsions
|
X
|
|
|
X
|
X
|
X
|
X
|
X
|
Á¦Å¸ ÀüÀ§
|
|
X
|
X
|
X
|
X
|
|
|
X
|
Á¦Å¸ ÀüÀ§
(°í¿°µµ ¹× À¯±â¿ëÁ¦)
|
|
|
X
|
X
|
X
|
|
|
X
|
PALS
|
|
|
X
|
|
X
|
|
|
X
|
ºÐÀÚ·®
|
X
|
|
|
X
|
X
|
|
X
|
X
|
¼öó¸® ÀÀ¿ëºÐ¾ß
|
|
|
X
|
|
X
|
|
|
X
|
|